metal gate process flow
由LWu著作·2013—OnestepfromtypicalCMOSprocessflowisthesource/drain(S/D)activationannealing,whichthegatestackmustundergo.ThetypicalS/D ...,Ametalgate,inthecontextofalateralmetal–oxide–semiconductor(MOS)stack,isthegateelectrodeseparatedbyanoxidefrom...
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由JRobertson著作·被引用734次—Thegatefirstprocess(Fig10a)followsthesameprocessflowaswithaSiO2gateoxide[62].Ingatefirst,wesequentiallydepositagateoxidelayer,gate ...
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